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FGM thin film fabrication with high acceleration field and pulsed laser deposition 2010.08.31

Takashi Nishiyama(Assistant Professor)Staff information
Kunihito Nakayama(Other)
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[ 研究概要 ] A fabrication method for functionally graded material (FGM) thin film using pulsed-laser deposition (PLD) and strong acceleration field is introduced. In a very strong acceleration field (about 1,000,000G), an atomic-scale-graded structure will be generated in the two-component bulk material system because of the difference with atomic weight and atomic volume of each atoms. But the behavior of atoms is not clarified when the target material is a thin film. We developed a centrifugal apparatus specialized to the experiment of FGM thin film and fabricated thin films by using PLD and acceleration field. High energy particles are supplied by PLD and it became another energy source. As a result, the composition gradient is confirmed at relatively lower acceleration field (lower than 10,000G). [ Related Key Word ] Functionally Graded Material (FGM) | High Acceleration Field | Laser Ablation [ Related URL ]  http://www.aero.kyushu-u.ac.jp/aml/index.html

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